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Product Description
Same CCS Technology found in our CCS buffer pads.
Conventional foam pads absorb polish too quickly. This reduces polish and pad performance because most of the polish is trapped below the working surface of the pad. CCS Technology™solves this common problem using strategic patterns of partially closed foam cells.
Conventional foam pads absorb polish too quickly. This reduces polish and pad performance because most of the polish is trapped below the working surface of the pad. CCS Technology™solves this common problem using strategic patterns of partially closed foam cells.
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